PLDEFRESITJęzyk: polski
Cosmia

Masque nutritif technique force

The ingredient list of Cosmia Masque nutritif technique force (face masks) has 26 items. It contains fragrance. No parabens, silicones or denatured alcohol on the list. 9 ingredients are subject to EU restrictions – details below.

26/26 recognised

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This product comes from Open Beauty Facts, an open database edited by volunteers. The ingredient list has not yet been verified by INCIMondo against the label; formulas can change over time and differ between markets.

Ingredients

  1. AQUA · Solvent
  2. CETEARYL ALCOHOL · Skin conditioning – emollient, Surfactant – emulsifying, Emulsion stabilising
  3. DIPALMITOYLETHYL HYDROXYETHYLMONIUM METHOSULFATE · Antistatic, Detangling, Hair conditioning
  4. CETYL ALCOHOL · Skin conditioning – emollient, Surfactant – emulsifying, Emulsion stabilising
  5. BENZYL ALCOHOL · Preservative, Solvent, Viscosity controllingEU restrictions
  6. CETEARETH-20 · Cleansing, Surfactant – emulsifying, Surfactant – cleansing
  7. PARFUM · Fragrance, Perfuming
  8. CETRIMONIUM CHLORIDE · Antimicrobial, Antistatic, Surfactant – emulsifyingEU restrictions
  9. HYDROXYETHYLCELLULOSE · Binding, Emulsion stabilising, Film forming
  10. PROPYLENE GLYCOL · Humectant, Fragrance, Solvent
  11. QUATERNIUM-80 · Antistatic, Hair conditioning
  12. POLYQUATERNIUM-37 · Antistatic, Film forming
  13. GLYCERIN · Denaturant, Hair conditioning, Humectant
  14. POLYQUATERNIUM-16 · Antistatic, Film forming
  15. ARGININE · Antistatic, Hair conditioning, Fragrance
  16. ETHYLHEXYLGLYCERIN · Deodorant, Skin conditioning
  17. HYDROLYZED CERATONIA SILIQUA SEED EXTRACT · Skin conditioning
  18. ZEA MAYS STARCH · Abrasive, Absorbent, Anticaking
  19. BENZYL SALICYLATE · Perfuming, Light stabilizerEU restrictions
  20. LIMONENE · Deodorant, Solvent, PerfumingEU restrictions
  21. HEXYL CINNAMAL · PerfumingEU restrictions
  22. SODIUM BENZOATE · Anticorrosive, Fragrance, PreservativeEU restrictions
  23. POTASSIUM SORBATE · Fragrance, PreservativeEU restrictions
  24. SODIUM HYDROXIDE · Buffering, DenaturantEU restrictions
  25. POLYQUATERNIUM-7 · Antistatic, Film formingEU restrictions
  26. GUAR HYDROXYPROPYLTRIMONIUM CHLORIDE · Antistatic, Film forming, Skin conditioning

An INCI list does not reveal exact concentrations.

Ingredient list as published

Aqua, Cetearyl Alcohol, Dipalmitoylethyl Hydroxyethylmonium Methosulfate, Cetyl Alcohol, Benzyl Alcohol, Ceteareth-20, Parfum, Cetrimonium Chloride, Hydroxyethylcellulose, Propylene Glycol, Quaternium-80, Polyquaternium-37, Glycerin, Polyquaternium-16, Arginine, Ethylhexylglycerin, Hydrolyzed Ceratonia Siliqua Seed Extract, Zea Mays (Corn) Starch, Benzyl Salicylate, Limonene, Hexyl Cinnamal, Sodium Benzoate, Potassium Sorbate, Sodium Hydroxide, Polyquaternium-7, Guar Hydroxypropyltrimonium Chloride.

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Ranked by shared ingredients (rarer ingredients count more). A similar ingredient list does not mean the same concentrations or effect.